Rapid heating RTP annealing furnace

The KJ-TRTP1000-S110LK1W rapid heating RTP annealing furnace is a tube type furnace with a high vacuum degree for rapid heat treatment, equipped with a quartz cavity and vacuum flange. It is heated by a halogen lamp, with a heating rate of up to 50 ℃/second and PID automatic control. It is designed specifically for annealing semiconductor or solar cell substrates. It belongs to a type of tube furnace.
 

Real photos of rapid heating RTP annealing furnace

name	Rapid heating RTP annealing furnace
Model	KJ-TRTP1000-S110LK1W
Controller	LED (heating curve time setting is in seconds)
Furnace	Open type and slide type
Furnace tube size	OD110 outer diameter
heating zone	200mm(Can be customized according to customer needs)
heating element	halogen lamp
heating rate	0~50 C/S
Thermocouple	Design and match according to actual needs
temperature controller	30 segment high-precision digital programmable temperature controller
special requirements	Video inspection before shipment, payment upon receipt 1. The furnace is a sliding open type; 2. The heating element is a halogen lamp; 3. The quartz tube is open at one end and closed at the other end; 4. Two air inlets and one air outlet on the flange; 5. Equipped with digital vacuum gauge 6. There is a baffle valve on the flange connected to the vacuum pump of DRV10, and the vacuum degree of the furnace tube is pumped to a cold state of 10Pa; 7. Connect a quartz bracket with a flange as shown in the following figure; 8. There is a simple nitrogen float and oxygen float flow meter on the box, with a maximum flow rate of 500ml/min.