What is the coating effect of CVD tube furnace?

The coating effect of CVD (chemical vapor deposition) tube furnace is usually better. Let’s take a look at the advantages of CVD tube furnace coating below!

Commonly used CVD electric furnaces for silicon dioxide coating (click on the image to view product details)

1. Good film uniformity: CVD tube furnace can achieve uniform distribution of reaction gas inside the tube furnace by precisely controlling parameters such as gas flow rate, temperature, and pressure, thereby depositing a thin film with uniform thickness on the substrate. For example, in semiconductor chip manufacturing, the use of CVD tube furnaces can deposit silicon dioxide thin films with thickness errors within a few nanometers on the wafer surface, meeting the strict requirements for film uniformity in large-scale integrated circuits.
2. High film quality: In the high-temperature environment of CVD tube furnace, the reaction gas can fully decompose and react, resulting in deposited films with good crystallinity and density. Taking titanium nitride film as an example, the titanium nitride film obtained by CVD tube furnace coating has high hardness, wear resistance, and corrosion resistance, and is widely used in the field of tool coating, which can significantly improve the cutting performance and service life of tools.
3. Accurate control of film thickness: By adjusting process parameters such as reaction time, gas flow rate, and deposition temperature, the growth rate and final thickness of the film can be precisely controlled. This characteristic gives CVD tube furnaces a great advantage in preparing functional films with specific thickness requirements, such as in the field of optics, where precise control of film thickness can be used to achieve interference filtering and other functions for specific wavelength light.
4. Capable of depositing multiple materials: Various metal, semiconductor, ceramic and other thin film materials can be deposited in a tube furnace by selecting different reaction gases and process conditions. For example, metal tungsten thin films can be deposited for interconnect structures in integrated circuits, semiconductor thin films such as zinc oxide can be deposited for optoelectronic devices, and ceramic thin films such as silicon carbide can be deposited for high-temperature protective coatings.
5. Good substrate adaptability: CVD tube furnace coating has strong adaptability to the shape and material of the substrate. Whether it is a flat substrate or a three-dimensional substrate with complex shapes, whether it is a metal substrate or a ceramic, polymer or other substrate, it can achieve good coating effects. For example, on micro/nano structured semiconductor devices, CVD tube furnaces can uniformly deposit thin films in their high aspect ratio grooves and holes, which is difficult to achieve with other coating methods.

Multi temperature zone tubular CVD electric furnace (click on the image to view product details)

Overall, CVD tube furnace coating is a highly effective technique in fields that require high film quality and performance. You can communicate the parameters with relevant technical personnel before choosing, in order to select the equipment that suits your coating requirements!Click to learn more cvd systems! Or click on online customer service to learn more about product information!