What is a high-temperature box type resistance furnace?High temperature box type resistance furnace is a commonly used high-temperature heating equipment, widely used in scientific research, production, and laboratory fields.
09-18
What are the respective application areas of vacuum furnaces and atmosphere furnaces?Vacuum furnaces and atmosphere furnaces play important roles in their respective application fields, meeting the processing needs of different materials and products by providing different working environments and conditions. Let’s take a look at the respective application fields of vacuum furnaces and atmosphere furnaces below!
09-18
How to choose a nitrogen muffle furnace?When choosing a nitrogen muffle furnace, multiple factors need to be considered comprehensively to ensure that it meets the specific needs of experiments or production. Let’s take a look at how to choose the most suitable nitrogen muffle furnace for yourself!
09-14
What are the advantages of PECVD tube furnace compared to CVD tube furnace?PECVD (plasma enhanced chemical vapor deposition) tube furnace exhibits significant advantages over CVD (chemical vapor deposition) tube furnace in multiple aspects, mainly reflected in technical principles, deposition conditions, deposition rate, film quality, and application fields.
09-13
Can PECVD electric furnace be used for graphene growth?PECVD electric furnace can be used for the growth of graphene. PECVD (Plasma Enhanced Chemical Vapor Deposition) is a technique that utilizes plasma to promote chemical reactions at low temperatures, resulting in the deposition of solid thin films on sample surfaces. During the growth process of graphene, PECVD technology activates the active species generated by plasma to react with carbon source molecules (such as methane, ethylene, etc.), causing carbon atoms to deposit layer by layer on the substrate, forming graphene.
09-13
Application of PECVD vacuum coating electric furnace in the semiconductor industryPECVD (Plasma Enhanced Chemical Vapor Deposition) vacuum coating electric furnace has a wide range of applications in the semiconductor industry, and its unique process characteristics and technological advantages make it play an important role in the semiconductor manufacturing process.
09-13
How to choose a PECVD vacuum coating electric furnace?When choosing a PECVD vacuum coating electric furnace, multiple factors need to be considered, including operating temperature and heating system, vacuum system, control system, gas supply system, equipment size and structure, as well as brand and after-sales service. By comprehensively considering these factors and combining them with specific process and production requirements, selecting the most suitable PECVD electric furnace can ensure coating quality and improve production efficiency.
09-13
Working principle of PECVD vacuum coatingThe working principle of PECVD vacuum coating is a complex and delicate process, involving multiple links such as gas supply, plasma generation, chemical reaction, deposition process, and control process. By precisely controlling the parameters and conditions in these links, thin film materials with excellent performance can be prepared.
09-13
Daily maintenance and upkeep of PECVD coating electric furnaceThe daily maintenance and upkeep of PECVD (plasma enhanced chemical vapor deposition) coating electric furnace are key to ensuring its long-term stable operation and extending its service life.
09-13
Common faults and solutions of PECVD coating electric furnacePECVD (Plasma Enhanced Chemical Vapor Deposition) coating electric furnace is widely used in the semiconductor industry, but it may also encounter some common faults during its operation.
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