The KJ-TRTP1000-S110LK1W rapid heating RTP annealing furnace is a tube type furnace with a high vacuum degree for rapid heat treatment, equipped with a quartz cavity and vacuum flange. It is heated by a halogen lamp, with a heating rate of up to 50 ℃/second and PID automatic control. It is designed specifically for annealing semiconductor or solar cell substrates.
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