What experiments can be conducted using a tubular CVD electric furnace for experiments?

The experimental tubular CVD electric furnace is a powerful heat treatment equipment that can complete experiments in multiple fields such as thin film deposition, nanomaterial preparation, ceramic sintering, semiconductor device manufacturing, solar cell manufacturing, optical material synthesis, pharmaceutical industry applications, high-temperature experiments, and powder metallurgy.

Thin film deposition: Various types of thin film materials can be prepared, such as silicon-based thin films (polycrystalline silicon, amorphous silicon thin films, used in solar cells, thin film transistors, etc.), silicon nitride thin films (used as insulation or passivation layers in integrated circuits and microelectromechanical systems), silicon carbide thin films (used in high-temperature, high-frequency electronic devices), silicon dioxide thin films (used as gate oxide or insulation layers, widely used in semiconductor devices), aluminum oxide thin films (used in high dielectric constant materials to improve device performance), zinc oxide thin films (with transparent conductivity, used in solar cells, sensors, etc.), titanium nitride thin films (used as diffusion barrier or conductive layers, used in integrated circuit interconnects), aluminum nitride thin films (used in piezoelectric sensors, surface acoustic wave devices) The Diamond like carbon thin films (with high hardness and low friction coefficient, used as wear-resistant coatings for mechanical parts) and graphene thin films (prepared by CVD method for large-area, high-quality graphene, used in electronic devices, sensors, etc.).

Nanomaterial preparation: By adjusting reaction conditions and substrate materials, nanomaterials with different morphologies and sizes can be synthesized, such as nanoparticles, nanowires, etc. These materials have broad application prospects in fields such as nanoelectronics and nanomedicine.
Ceramic sintering: It can be used for powder roasting and sintering of ceramic materials to prepare high-performance ceramic products.

Semiconductor device manufacturing: In the semiconductor industry, it is commonly used to manufacture dielectric layers, low-k dielectric materials, and silicon-based optoelectronic devices in integrated circuits. For example, in CMOS devices, it is commonly used for the manufacturing of gate oxide layers and field oxide layers.

Solar cell manufacturing: It is one of the main deposition technologies for manufacturing solar cells and photovoltaic modules. It can uniformly deposit thin films on wide surface areas such as solar panels or optical glass. By adjusting plasma parameters, the refractive quality of optical coatings can be finely controlled, thereby improving the photoelectric conversion efficiency of solar cells.

Optical material synthesis: can be used to synthesize transparent optical materials for the preparation of optical devices and optical coatings.

Application in the pharmaceutical industry: In the medical field, it can be used to manufacture biocompatible thin film materials for the treatment of cardiovascular diseases, etc.

Other high-temperature experiments: As experimental equipment, it can also be used for various research experiments such as high-temperature atmosphere sintering, atmosphere reduction, vacuum annealing, etc., providing strong support for research in the fields of materials science and engineering.

Powder metallurgy: The formation of metal or ceramic materials through gas-phase reactions provides a new preparation method for the field of powder metallurgy.