What processes are used in vacuum tube CVD electric furnaces?

The vacuum tube CVD electric furnace, with its precise temperature control, reliable safety performance, and flexible gas processing capability, has demonstrated core value in multiple process fields. The specific application processes are as follows:

1. Thin film deposition process
Preparation of Semiconductor Thin Films
Application scenarios: Deposition of metal thin films (such as aluminum and copper), semiconductor thin films (such as silicon and silicon carbide), and insulation layers (such as silicon dioxide) on the surface of wafers.
Technical advantage: By precisely controlling gas flow rates (such as silane and methane) and reaction pressures (low pressure to 10 ⁻ Pa), the uniformity of film thickness is better than ± 2%, meeting the demand for high-precision films in integrated circuit manufacturing.
Typical case: In the epitaxial growth of gallium nitride (GaN), high-quality thin films with dislocation density<1 × 10 ⁸ cm ⁻ ² were successfully prepared by controlling the ammonia flow rate (50-200 sccm) and reaction chamber pressure (5-50 Torr), resulting in a 40% increase in growth rate and a 25% increase in raw material utilization.
Optical thin films and coatings
Application scenario: Synthesize transparent optical materials (such as silicon oxide and silicon nitride) for the preparation of optical devices (such as lenses and filters) and optical coatings (such as anti reflective films and reflective films).
Technical advantage: The vacuum environment can avoid impurity contamination, ensuring high purity and optical performance of the film. For example, in the field of photovoltaics, the conversion efficiency of deposited silicon thin film solar cells can reach over 20%, and there is no photoinduced attenuation problem.
Nanomaterial thin film
Application scenario: By adjusting reaction conditions, nanostructured thin films such as nanoparticles and nanowires are synthesized and applied in fields such as nanoelectronics and nanomedicine.
Technical advantage: Supports heterostructure growth (such as silicon/silicon carbide, gallium nitride/sapphire), achieves interface optimization between different materials, and improves device performance.

2. Material synthesis and modification process
Preparation of nanomaterials
Application scenarios: Synthesize nanomaterials such as carbon nanotubes and nano zinc oxide for use in sensors, catalysts, and other fields.
Technical advantage: By controlling the reaction temperature (such as 600-1200 ℃) and gas ratio (such as hydrogen/argon gas mixture), precise control of the morphology and size of nanomaterials can be achieved.
Ceramic material sintering
Application scenario: Ceramic powder roasting and sintering to prepare high-performance ceramic products (such as alumina ceramics and silicon nitride ceramics).
Technical advantage: Vacuum environment can reduce gas pores during ceramic sintering process, improve material density and hardness. For example, in glass melting, vacuum conditions can reduce bubbles and improve optical transparency.
Metal material processing
Application scenarios: Metal film expansion welding, heat treatment under vacuum or protective atmosphere (such as annealing, quenching).
Technical advantages: By precisely controlling the heating rate (such as 5 ℃/min) and holding time (such as 4 hours), optimizing the microstructure of metals and improving material properties. For example, in aviation manufacturing, vacuum annealing process can reduce residual stress of TC4 titanium alloy parts to<50 MPa and increase fatigue life by three times.

3. Energy and Environmental Protection Technology
Preparation of Photovoltaic Cell Materials
Application scenario: Deposition of silicon thin film solar cells and compound semiconductor thin films (such as CdTe, CIGS) to enhance photoelectric conversion efficiency.
Technical advantage: Vacuum environment can prevent material oxidation and ensure film quality. For example, silicon thin film solar cells prepared by CVD method have a conversion efficiency of over 20% and high stability.
Clean energy production
Application scenario: Organic waste is converted into synthesis gas (CO+H ₂) through high-temperature pyrolysis, providing raw materials for fuel cells.
Technical advantages: Vacuum conditions can optimize the pyrolysis reaction path, improve the yield and purity of synthesis gas.
Waste disposal and resource utilization
Application scenarios: High temperature incineration or pyrolysis of electronic waste, waste plastics, etc., to achieve harmless treatment and precious metal recycling.
Technical advantage: Vacuum environment can reduce the generation of harmful substances such as dioxins and improve processing safety.

4. High end manufacturing and protective technology
Aerospace Materials
Application scenario: CVD silicon carbide coating can resist high-temperature airflow erosion at 3000 ℃ and is used in rocket engine nozzles.
Technical advantage: The vacuum environment can ensure the compactness of the coating and improve the high temperature resistance of the material.
Nuclear energy field
Application scenario: SiC coating covers fuel particles to ensure safe operation of nuclear reactors.
Technical advantage: Vacuum conditions can prevent coating oxidation and improve material radiation resistance.
automotive industry
Application scenario: Silicon carbide inverter improves charging efficiency by 30% and increases battery life by more than 10%.
Technical advantages: Vacuum CVD furnace can prepare high-purity silicon carbide materials and optimize device performance.

5. Experimental and R&D processes
High temperature atmosphere sintering
Application scenario: Conduct high-temperature sintering experiments of materials under vacuum or atmosphere protection to study material phase transition and performance evolution.
Technical advantage: Supports multi-stage program temperature control (such as 30 stages) to meet complex process requirements.
Atmosphere restoration experiment
Application scenario: Conduct metal reduction experiments in reducing atmospheres such as hydrogen to prepare high-purity metal powders.
Technical advantage: Precise control of gas ratio (such as nitrogen/hydrogen mixing ratio accuracy ± 0.5% VOL), ensuring experimental repeatability.
Optimization of CVD experiment
Application scenario: Study the influence of different gas precursors (such as methane and acetylene) on the properties of thin films and optimize process parameters.
Technical advantage: Integrated in-situ monitoring module (such as laser interferometer), real-time monitoring of film growth rate and composition changes.