What is the temperature of the bell type lifting high-temperature muffle furnace?

The temperature range of the bell type lifting high-temperature muffle furnace is usually from room temperature to 1800 ℃, and some models can be extended to 2000 ℃ or higher, depending on equipment configuration and process requirements. The following is an explanation from five dimensions: temperature range, typical models, temperature control accuracy, heating elements, and industry applications:

1. Temperature range: covering the complete spectrum from low temperature to ultra-high temperature
The temperature range of the bell jar furnace can be flexibly designed according to process requirements, and common ranges include:
Low temperature range (room temperature -500 ℃): suitable for material preheating, drying, or low-temperature sintering processes, such as ceramic body drying, metal powder pretreatment, etc.
Medium temperature range (500 ℃ -1500 ℃): covering most material science and chemical experimental needs, such as metal annealing, ceramic sintering, catalyst preparation, etc. For example, when annealing titanium alloys, the medium temperature range can avoid hydrogen absorption or oxidation of the material, while optimizing the grain structure.
High temperature range (1500 ℃ -3000 ℃): suitable for high-temperature experiments, such as material melting, graphitization, high-temperature sintering, etc. For example, when synthesizing silicon carbide (SiC) ceramics, the high temperature range can promote carbon atom diffusion, improve reaction rate and product purity.

2. Temperature control accuracy: meets high-precision process requirements
The bell jar furnace achieves high-precision temperature control through the following technologies:
PID intelligent temperature control system: using microcomputer control, programmable to set multiple temperature curves, automatically adjusting heating power to ensure low temperature fluctuations.
High precision sensors: equipped with N-type, S-type or B-type thermocouples, real-time monitoring of furnace temperature, and feedback of data to the control system to form closed-loop control.
Uniform heating design: Heating elements are evenly distributed around the furnace, combined with ceramic fiber insulation layer to reduce temperature gradient and ensure high temperature balance inside the furnace.

3. Heating element: adaptable to different temperature requirements
Bell type furnace selects different types of heating elements based on temperature range:
Resistance wire: suitable for low temperature range (≤ 1200 ℃), low cost, but prone to oxidation at high temperatures, with a short lifespan.
Silicon carbon rod: suitable for medium temperature range (1200 ℃ -1400 ℃), with excellent oxidation resistance and high heating efficiency, but may evaporate after long-term use.
Silicon molybdenum rod: suitable for high temperature range (≥ 1600 ℃), stable under vacuum or inert atmosphere, extremely low volatility, suitable for long-term high temperature treatment.

4. Industry application: precise matching of temperature range and process
The temperature range of bell jar furnaces can meet the process requirements of different industries:
Aerospace: When annealing titanium alloys, vacuuming to 10 ⁻ ³ Pa and heating to 750 ℃ can improve the fatigue life and fracture toughness of the material after annealing.
Semiconductor manufacturing: When annealing silicon wafers, vacuum them to 10 ⁻⁴ Pa and then heat them to 1000 ℃. After annealing, the surface roughness of the wafer decreases and metal impurity contamination is reduced.
Ceramic sintering: When sintering silicon nitride (Si ∝ N ₄) ceramics, vacuum to 10 ⁻ Pa and then introduce nitrogen gas. After sintering, the material density is higher and the bending strength is stronger.
Material synthesis: When synthesizing titanium carbide (TiC) ceramics by vacuum hot pressing method, vacuum is applied to 10 ⁻ Pa and then pressure is applied, resulting in stronger hardness and improved wear resistance of the synthesized material.