Common faults and solutions for customized PECVD electric furnaces

Common faults that may occur during the coating process of customized PECVD electric furnaces include inability to glow, unstable glow, poor film quality, and low deposition rate. The following are detailed reasons and solutions for these faults:

Unable to light up
Reason:
RF power supply failure, check if the power output of the RF power supply is normal.
The intake volume of the reaction gas is small. Check if the gas flow meter is normal. If it is normal, increase the intake volume for testing.
The cleanliness of the cavity plates is insufficient. Use a multimeter to measure the ground resistance of the upper and lower plates of the cavity. The normal value should be above tens of megaohms. If there is an abnormality, clean the cavity plates.
RF matching circuit fault, check if the reflected power of the RF source is within the normal range. If abnormal, check if the capacitors and inductors in the matching circuit are damaged.
The vacuum degree is too poor. Check if the chamber vacuum degree is normal.
Solution:
Repair or replace the RF power supply.
Adjust the gas flow meter to ensure sufficient intake of reaction gas.
Clean the chamber plates to improve cleanliness.
Repair or replace capacitors and inductors in the RF matching circuit.
Inspect the vacuum system and increase the vacuum level.

Unstable glow
Reason:
The power supply current is unstable, measure whether the power supply is stable.
The pressure in the vacuum chamber is unstable. Check if the leakage rate of the vacuum system in the chamber is normal and if the air intake in the chamber is normal.
Cable malfunction, check if the cable contact is good.
Solution:
Ensure stable power supply.
Inspect the vacuum system to ensure stable pressure in the vacuum chamber.
Check the cable contact condition to ensure good contact.

Poor film-forming quality
Reason:
The cleanliness of the sample surface is poor. Check if the sample surface is clean.
Poor cleanliness of the process chamber, cleaning the process chamber.
The sample temperature is abnormal. Check if the temperature control system is functioning properly and calibrate the temperature measuring thermocouple.
Abnormal pressure during film deposition process, check the leakage rate of the vacuum system in the chamber.
The RF power setting is unreasonable. Check the RF power supply and adjust the set power.
Solution:
Clean the surface of the sample to improve cleanliness.
Clean the process chamber to improve cleanliness.
Repair the temperature control system, calibrate the temperature measuring thermocouple, and ensure that the sample temperature is normal.
Inspect the vacuum system to ensure stable pressure during the film deposition process.
Adjust the RF power settings to ensure they are reasonable.

Low deposition rate
Reason:
The RF input power is not suitable, adjust the RF power.
The sample temperature is abnormal. Check if the cooling water flow rate and temperature are normal.
The vacuum chamber pressure is low, adjust the process gas flow rate.
Solution:
Adjust the RF input power to increase the deposition rate.
Check the flow rate and temperature of the cooling water to ensure that the sample temperature is normal.
Adjust the process gas flow rate and increase the vacuum chamber pressure.