Can a desktop mini tube stove be ventilated with gas?

The desktop mini tube furnace can pass gas, and its gas control function is one of its core advantages, which is reflected in the following aspects:

1. Gas type compatibility
Inert gas: Supports nitrogen (N ₂), argon (Ar), etc., used to prevent material oxidation or decomposition (such as high-temperature sintering of ceramics, synthesis of nanomaterials).
Reductive gases: can be introduced with hydrogen (H ₂), carbon monoxide (CO), etc., to participate in chemical reactions (such as metal surface carburizing, catalyst reduction).
Oxidative gas: Some models support oxygen (O ₂) or air, suitable for oxidation experiments such as metal oxidation and catalyst calcination.
Mixed gas: Through a dual inlet design, the ratio of inert/reducing gases can be adjusted (such as argon+hydrogen mixed atmosphere).

2. Gas control accuracy
Flow regulation: Equipped with a mass flow controller (MFC) or a float flowmeter to accurately control gas flow (such as 0-500sccm), ensuring reaction stability.
Airtight design: using double ring sealing flanges, silicone sealing rings or quick opening flanges to prevent gas leakage (vacuum degree can reach 10 ⁻ Pa).
Pressure monitoring: Some models are integrated with mechanical pressure gauges, which display real-time furnace air pressure (range -0.1 to 0.15 MPa) to avoid the risk of excessive pressure.

3. Typical application scenarios
Chemical Vapor Deposition (CVD): A precursor gas (such as SiH ₄, NH3) is introduced at high temperature to deposit a thin film (such as silicon nitride, graphene) on a substrate.
Nanomaterial synthesis: Pyrolysis of precursors in an inert atmosphere to synthesize high-purity nanoparticles (such as TiO ₂ SiC）。
Metal heat treatment: Annealing and quenching in hydrogen or argon gas to improve the mechanical properties of metals (such as stainless steel powder metallurgy).
Catalyst preparation: Calcination of alumina support in nitrogen and loading of active components (such as Pt/Al ₂ O3 automotive exhaust catalyst).
Semiconductor process: Gallium nitride thin films are grown by MOCVD in a mixed atmosphere of ammonia and trimethyl gallium.

4. Operation and safety design
Program temperature control: supports multi-stage program temperature control (such as 30 stages), can preset gas inlet time and temperature curve, and achieve automated experiments.
Security protection:
Overtemperature alarm: Automatically shuts off when the temperature exceeds the set value.
Pressure interlock: Automatically exhausts when the air pressure is too high to prevent the furnace tube from bursting.
Furnace temperature protection: Do not open the furnace door when the furnace temperature is ≥ 300 ℃ to avoid burns.
Convenient maintenance: Modular design facilitates the replacement of gas path components (such as flow meters and sealing rings), reducing maintenance costs.

5. Actual cases
Ceramic sintering: Vacuum sintering alumina ceramics in an argon atmosphere at 1600 ℃, with high density, suitable for electronic packaging substrates.
Metal powder metallurgy: Stainless steel powder is reduced and sintered in hydrogen at 1400 ℃, with low porosity, and used for 3D printing of metal parts.
Preparation of catalyst support: Calcination of γ – Al ₂ O3 in a nitrogen atmosphere at 800 ℃, with a large specific surface area, used for automobile exhaust purification.