Desktop mini tube furnace applicable process

Desktop mini tube furnaces are suitable for various laboratory and industrial processes due to their compact design, flexible configuration, and precise temperature control. The specific applicable processes are as follows:

1. CVD (Chemical Vapor Deposition) process
Application scenario: CVD process utilizes gaseous precursors to undergo chemical reactions at high temperatures, depositing thin films or nanoparticles on the surface of substrate materials. Desktop mini tube furnace provides a stable environment for CVD process by precisely controlling temperature and atmosphere.
Specific case: In the development of carbon nanotubes, a desktop mini tube furnace can introduce carbon source gas (such as methane) at high temperatures to deposit carbon nanotubes on the catalyst surface. In addition, it can also be used for coating crystalline silicon substrates and depositing thin films such as silicon nitride (Si ∝ N ₄), with better thickness uniformity.

2. Heat treatment process
Application scenarios: Heat treatment processes include annealing, quenching, tempering, etc., aimed at improving the mechanical, physical, and chemical properties of materials. Desktop mini tube furnace achieves material heat treatment by precisely controlling heating rate, insulation time, and cooling rate.
Specific case: In diffusion welding of metal materials, a desktop mini tube furnace can perform heat treatment on the metal material at high temperatures, promoting atomic diffusion and achieving welding. In addition, it can also be used for annealing treatment of metal materials, eliminating internal stress, and improving the plasticity and toughness of materials.

3. Material synthesis and processing under vacuum or atmosphere
Application scenarios: Certain materials require specific atmospheric environments (such as vacuum, inert gases, reducing gases, etc.) during synthesis or processing. The desktop mini tube furnace can achieve material synthesis and processing under vacuum or atmosphere by equipped with a vacuum pump and gas control system.
Specific case: In the ceramic sintering process, a desktop mini tube furnace can perform high-temperature sintering of ceramic powder under vacuum or inert gas (such as nitrogen, argon) environment, improving the density and mechanical properties of ceramics. In addition, it can also be used in metal powder metallurgy to reduce and sinter metal powders in a reducing gas (such as hydrogen) environment to prepare high-purity metal materials.

4. Preparation of nanomaterials
Application scenarios: Nanomaterials have unique physical and chemical properties and are widely used in fields such as electronics, optics, catalysis, etc. Desktop mini tube furnace can achieve the preparation of nanomaterials by precisely controlling temperature and atmosphere.
Specific case: Under Ar atmosphere, a desktop mini tube furnace can pyrolyze precursors at 1200 ℃ to synthesize high-purity TiO ₂ and SiC nanoparticles. These nanoparticles have excellent properties and can be used to prepare high-performance catalysts, sensors, and electronic devices.

5. Preparation of catalyst support
Application scenario: The catalyst carrier is an important component of the catalyst, and its performance directly affects the activity and stability of the catalyst. Desktop mini tube furnace can be used to prepare catalyst supports with high specific surface area.
Specific case: Under N ₂ atmosphere, a desktop mini tube furnace can calcine γ – Al ₂ O3 at 800 ℃ to prepare catalyst supports with larger specific surface area. This carrier has excellent adsorption performance and catalytic activity, and can be used as a catalyst for automobile exhaust purification.

6. Semiconductor annealing
Application scenario: Semiconductor annealing is an important process in semiconductor manufacturing, aimed at eliminating lattice defects and improving carrier mobility. Desktop mini tube furnace can achieve semiconductor annealing treatment by precise control of temperature and atmosphere.
Specific case: During the 1200 ℃ N ₂ annealing process of silicon-based solar cells, a desktop mini tube furnace can reduce defect density and improve conversion efficiency. In addition, it can also be used for annealing treatment of other semiconductor materials, such as gallium nitride (GaN), silicon carbide (SiC), etc.