What are the advantages of laboratory tubular PECVD electric furnace?

The laboratory tubular PECVD electric furnace combines the advantages of tubular furnace and plasma enhanced chemical vapor deposition (PECVD) technology, demonstrating significant advantages in fields such as new energy material preparation and semiconductor device development. The following is a detailed analysis of its core advantages:

1. Low temperature process and material compatibility
Low temperature sedimentation ability
Advantages: Traditional CVD technology requires high temperatures above 800 ℃, while PECVD uses plasma to excite reaction gases, reducing the deposition temperature to 200-450 ℃.
Application scenario: Suitable for thin film deposition of thin silicon, flexible substrates (such as polyimide), and heat sensitive materials (such as perovskite), avoiding material deformation or performance degradation caused by high temperature.
Scope of application for wide materials
Advantages: It can handle various substrate materials such as metals, ceramics, glass, polymers, etc.
Case: In the field of photovoltaics, a silicon nitride (SiNx) anti reflection film can be deposited on the surface of silicon wafers; In the field of flexible electronics, transparent conductive zinc oxide (ZnO) films can be deposited on polyester films.

2. Efficient sedimentation and precise control
High sedimentation rate
Advantages: Plasma enhances reaction activity and deposition rate far higher than traditional CVD technology.
Benefit: Shorten the experimental cycle, improve research and development efficiency, especially suitable for rapid iteration of new material development.
Uniformity and thickness control of thin films
Advantage:
Multi zone design: By independently controlling the temperature of each zone (such as a 6-zone heating plate), the temperature difference within the surface is minimized to ensure uniform film thickness.
Dynamic compensation algorithm: Real time adjustment of heating power, compensation for temperature fluctuations, and improvement of process stability.
Case: In photovoltaic cell manufacturing, a uniform SiNx film can reduce light reflection loss and improve cell conversion efficiency.
Accurate regulation of composition and structure
Advantages: By adjusting plasma parameters such as power, pressure, and gas flow rate, the stoichiometry, crystallinity, and surface morphology of the thin film can be controlled.
Application: Deposition of amorphous silicon (a-Si), microcrystalline silicon (μ c-Si), or polycrystalline silicon (poly Si) thin films to meet the needs of different types of solar cells.

3. Multifunctionality and process flexibility
Multi functional sedimentation capability
Advantages: It can deposit various dielectric films (such as SiO ₂, Si ∝ N ₄, Al ₂ O ∝) and functional thin films (such as transparent conductive films, anti reflection films, passivation films).
case
PERC cell: Deposition of Al ₂ O ∝/SiNx laminated film on the backside to achieve dual functions of passivation and anti reflection.
TOPCon battery: Deposition of tunneling oxide layer (SiO ₂) and doped polycrystalline silicon layer to construct efficient carrier transport channels.
Process flexibility
Advantages: Supports normal or low pressure operation, compatible with continuous or intermittent sedimentation modes, and adaptable to different experimental needs.
Case: In laboratory research, the preparation conditions of new thin film materials can be explored by adjusting process parameters such as temperature, plasma power, and gas ratio.

4. Environmental Protection and Economy
energy conservation and emission reduction
Advantages: Low temperature technology reduces energy consumption, avoids harmful substance emissions at high temperatures, and conforms to the trend of green manufacturing.
Data: Compared to traditional CVD technology, PECVD can reduce energy consumption.
cost optimization
Advantage:
High yield: precise control to reduce material waste and rework rate.
Long lifespan: The plasma cleaning function can regularly remove deposits inside the furnace tube, extending the service life of the equipment.
Case: In photovoltaic cell production lines, PECVD equipment has a higher overall yield and significantly reduces unit costs.

5. Intelligence and operational convenience
Intelligent temperature control system
Advantages: Adopting PID control and self-tuning technology, supporting multi-stage programmable temperature curve settings, and a user-friendly interface.
Case: Automated operation is achieved by setting parameters such as temperature, time, and gas flow rate through a touch screen.
Security protection design
Advantages: Equipped with safety functions such as over temperature protection, leakage protection, and gas leakage alarm to ensure experimental safety.
Case: During high temperature operation, if the temperature exceeds the set value, the system automatically cuts off the heating power and alarms.