1. Operation Temperature: 1100℃,(1200℃ for short time);
2. Maximum energy efficiency is achieved by surrounding the chamber with thermal-efficient alumina fiber ceramic insulation.
3. Heavy duty double layer structure with cooling fan. Lower temperature in outside case.
4. Max. heating rate > 50°C/s and cooling rate > 10°C/s
5. Can be used for graphene-growing or CVD system for the experiment for the RTP requirement.
6. PID automatic control via current limiting phase angle fired the resistor, e.g. SCR(Silicon Controlled Rectifier).
7. Power control with 30 segments programmable.
8. Vacuum, in reducibility or protective atmosphere.
Descriptions:
Max. Temperature |
°C |
1200(1 hour) |
Work Temperature |
°C |
1100 |
Max Heating&cooling
rate |
°C/S |
≤10 |
Tube Size |
mm |
High purity quartz pipe Φ80×1400(Can be customized according to customer needs) |
Heating zone Length |
mm |
440(Can be customized according to customer needs) |
Constant Temp. zone Length |
mm |
200±1°C |
Temp.
Control |
|
30 programmable segments for precise control of heating rate, cooling rate and dwell time.
Built in PID Auto-Tune function with overheating & broken thermocouple broken protection.
Over temperature protection and alarm allows for operation without attendant(s).
+/- 1 ºC temperature accuracy.
RS485 Communications Port. |
Accuracy |
°C |
±1 |
Standard Accessory |
Special tube 1pcs,SS sealing flange 1set,Sealing Realing 2set ,High-temperature glove1pair, Crucible hook one pcs |
Adopted Accessory |
quartz block,quartz crucible, and quartz hook |
Size |
mm |
550×380×600 mm(furnace)(Can be customized according to customer needs)
1500×380×620 mm(furnace+track)(Can be customized according to customer needs) |