RTP Tube Furnace
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 RTP Rapid annealing tube furnace

RTP Rapid annealing tube furnace

Description:RTP Rapid annealing tube furnace is designed for annealing semiconductor wafer or solar cell.Can be customized according to your needs.can choose according to the RTP tube furnace image and the table parameters in detail, and then contact us to get the price.
     RTP tube furnace is heated by halogen light around the processing tube with a max. heating rate of max. 300°C/min. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps.

 Features of Rtp tube furnace :

(1). Great temperature uniformity.
(2) Over temperature protection and alarm.
(3) PID automatic control via SCR power control.
(4) Halogen heating element for fast heating.
(5) Sliding Chamber for fast cooling.

Technical parameters :
Limiting temperature 1200¡æ(max up to 1700)
Display LED
Structure Split and Rail Chamber
Temperature Zone Single
Temperature Control Accuracy ±1°C
Constant hot zone length 50mm (±2°C) ; 80mm (±3°C)
Tube Material Quartz Tube
Heating Element IR Lamps
Sealing Vacuum Flange
Temperature Control PID automatic control via SCR power control
Heating curves 30 steps programmable
Chamber material Alumina Fiber
Warranty One year limited warranty (Consumable parts such as heating elements are not covered by the warranty)

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

prev£º1200¡æ RTP tube furnace