PECVD electric furnace with exhaust gas treatment device

KJ-TTECVD1100-S100CK1 plasma enhanced chemical vapor deposition (PECVD) is a thin film growth technique that utilizes glow discharge (plasma) reactions to generate thin films containing gaseous substances. The system consists of a high-power RF power supply, a vacuum system, and a tube furnace, equipped with a spray tower and an activated carbon box to meet the needs of exhaust gas treatment. This device is designed to enable chemical reactions to occur at lower temperatures, utilizing the activity of plasma to promote the reaction. The reaction gas can be stimulated to decompose, dissociate, and ionize in glow discharge plasma, greatly increasing the activity of reactants. These reactive neutral substances are easily adsorbed onto the basic surface at lower temperatures, undergoing non-equilibrium chemical reactions and depositing to form thin films. Our company has designed this equipment according to the experimental requirements, which meets the needs of various thin film research. Click to view more types of PECVD electric furnaces!

Actual photo of PECVD electric furnace with tail gas treatment device

1. Good finished product quality: PECVD has the advantages of low basic temperature, fast deposition rate, good film quality, fewer pinholes, and less susceptibility to cracking.
2. Equipped with exhaust gas treatment device: equipped with spray tower, activated carbon box, centrifugal blower and other exhaust gas treatment devices to meet the needs of exhaust gas treatment.
3. Protective atmosphere: The flange is equipped with an inlet and outlet cyclone adapter, which can introduce inert protective gases such as nitrogen and argon, and can be used in an atmospheric environment.
4. Safety protection function: Safety protection, with over temperature protection function. When the temperature exceeds the allowable set value, the automatic alarm protection function is activated, ensuring safe and reliable operation.
5. Good deposition effect: Plasma has strong chemical activity and is prone to reactions, resulting in the deposition of the desired thin film on the substrate.
6. Intelligent multi-stage PID programmable: The temperature control system adopts PID intelligent program temperature control, with self-tuning function and the ability to program multi-stage temperature rise and fall.