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pecvd System
pecvd System

pecvd System

Model:KJ-O1200-4CPECVD

Description:

pecvd System(Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 600W RF plasma source,

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Brief Introduction of pecvd System:  

PECVD is a compact PECVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 600W RF plasma source, 120mm O.D split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump. 
 

Technical Parameter:

Model KJ-O1200-4CPECVD
Tube Furnace Display LED
Max. Temperature 1200℃
Continuous Woking Temp. ≤1100℃
Heating Rate 0~20℃/min
Temperature Zone length 440mm
Accuracy ±1℃
Tube Size Ф120mm x 1400mm
Temperature Control PID automatic control via SCR power control
Heating curves 30 steps programmable
Power 220V, 50 or 60Hz, single phase at max. 2.5KW
Plasma RF Power 
supply 
Output Power 5 -600W adjustable with ± 1% stability
RF frequency 13.56 MHz ±0.005% stability
Reflection Power 200W max.
Matching Automatic
RF Output Port 50 Ω, N-type, female
Noise <50 dB. 
Cooling Air cooling.
Power  220V, 50 or 60 Hz
Ditial Vacuum Gauge 1x10-6 to 1125 Torr measurement range
Anti-corrosive, gas-type independent 

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

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web@kejiafurnace.com
Address:
No.18 Hongye Road, Hi-tech zone , Zhengzhou, China, 450000
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181-3719-5600

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web@kejiafurnace.com

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